For the 233rd ECS Meeting that is. Additional rooms have been secured at the Crowne Plaza with rates beginning at $199/night.
Book now for free WiFi, a 24-hour fitness center, and a short walk to the meeting venues, all in the heart of downtown Seattle.
Do not delay, this special room rate is only available until April 20, 2018.
Register now for the meeting!
Over 2,600 abstracts across 46 symposia from the upcoming 233rd ECS Meeting in Seattle, WA are now available for download in the ECS Digital Library!
ECS Meeting Abstracts contain extended abstracts of the technical papers presented at the ECS biannual meetings and ECS-sponsored meetings. This publication offers a first look into the current research in the field. ECS Meeting Abstracts are freely available to all visitors of the ECS Digital Library.
With over 60,000 total abstracts available electronically, be sure to check out content from past meetings!
Did you know? All ECS Transactions, Journal of The Electrochemical Society, and ECS Journal of Solid State Science and Technology articles that develop out of ECS Meeting Abstracts are linked back to their original abstracts in the digital library.
Don’t forget to join us in Seattle! The early bird deadline has passed, but there is still time to register!
Professional development workshops are a growing feature of the ECS biannual meetings. Several new and recurring workshops being held at the 233rd ECS Meeting in Seattle, WA. The workshops are led by industry and career professionals in order to best serve the interests for mid- and early-career researchers and students.
An Introduction to Intellectual Property
Instructor: Matthew Rappaport, IP Checkups, Inc.
In recent years intellectual property has become contentious with notable high-tech companies influencing patent rights. Nevertheless, IP continues to play a key role in the development and innovation ecosystem, particularly for start-ups and early-stage commercialization. In this short course, we will get down to basics in exploring the role of IP in protecting your early-stage development and commercialization. Along the way, we will review IP basics and explore portfolio development to help protect your inventions. Decisions such as internal R&D, strategic partnerships or licensing are informed by your portfolio. And finally, what to do when you have to enforce your rights. This workshop is 2.5 hours.
Topic Close-up #11Symposium E04: Electrodeposition of Reactive Metals and Alloys for Energy Storage
Symposium purpose is to bring together experts from the fields of electrodeposition and energy storage to discuss and learn about the science and technological issues in this fascinating topic which we share. Electrodeposition or plating of reactive compounds is common place in energy storage applications such as metal-air, lithium metal and next generation sodium, magnesium or calcium battery concepts. On the other hand, high quality coatings of reactive metals and alloys such as aluminum, magnesium, vanadium and zinc find applications in anti-corrosion coatings, microelectronics, fuel cells, electrolyzers, supercapacitors and sensors. We welcome all abstracts about novel deposition processes, electrolytes and additives, insights in kinetics, nucleation and growth phenomena, as well as on advanced applications in this field.
Confirmed Invited Speakers include Dr. Fanny Barde of Toyota Motor Europe, Dr. Debra R. Rolison of NRL, Prof. Craig B. Arnold from Princeton University, Prof. Takayuki Homma from Waseda University and Snehashis Choudhury, young investigator at Cornell University (group of prof. Lynden Archer).
Topic Close-up #10Symposium G02: Atomic Layer Deposition Applications 14
Symposium Focus: This symposium focuses on a variety of applications of ALD and other atomic layer-by-layer processing in semiconductor CMOS (e.g. high-k oxides and metals for memories like Flash and 3D NAND, MIM, MIS capacitors), photovoltaics, energy storage and conversion, catalysis, optics and photonics, smart coatings of nanoporous materials, MLD and hybrid ALD/MLD, fundamentals of ALD processing: reaction mechanisms, in-situ measurement, modeling, theory, new precursors and delivery systems, optical and photonic applications, productivity enhancement, scale-up and commercialization of ALD equipment and processes for rigid and flexible substrates, including roll-to-roll deposition, spatial ALD, area-selective ALD, Atomic Layer Etching (‘reverse ALD’) and related topics aiming at self-limited etching.
ECS has scheduled three short courses to be held at the 233rd ECS Meeting in Seattle, WA. The courses will be held on Sunday, May 13, 2018 from 0900h to 1430h. Registration for a short course includes a breakfast (0800-0900h), lunch, and morning/afternoon coffee breaks.
The offerings are:
Short course #1: Advanced Impedance Spectroscopy | Course description
Mark Orazem, Instructor
Short course #2: Rechargeable Battery Materials | Course description
Shirley Meng and Boryann Liaw, Instructors
Short course #3: Electrodeposition Fundamentals and Applications | Course description
Stanko Brankovic and Giovanni Zangari, Instructors
Pre-registration for a short course is required by Monday, May 7, 2018. The registration fee for each course includes participation in the course, materials, continental breakfast, luncheon, and refreshment breaks; the short course registration fee does not include or apply to the general meeting registration, and it is not applicable to any other activities of the meeting. All individuals participating in short courses along with the meeting are required to register for both events.
Register by the early bird deadline of April 9, 2018 to receive a meeting and short course registration discount!
Only one month left to save $125 on registration!The 233rd ECS Meeting will take place May 13-17, 2018 at the Seattle Sheraton and Washington State Convention Center.
If our strong technical program, of over 2,600 abstracts being presented in 43 symposia across five days, wasn’t enough of a reason to join us, check out some of the other exciting events taking place in Seattle.
Topic Close-up #9Symposium G03: SiGe, Ge, and Related Compounds: Materials, Processing, and Devices 8
Symposium Focus: This meeting is the 8th International ECS SiGe Symposium for the past 16 years (www.sigesymposium.com). It will provide a forum for people from industry, research institutions, and academics around the world to gather together in an unique and relaxed environment, reviewing and discussing materials and device related aspects of SiGe, Ge, and Related Compounds (Group IV incl. C and Sn alloys, and III/V on Si, as well as 2D materials). There are 10 areas of interests covering very broad spectrum from devices to fundamental material characterization, to stimulate information exchange and innovations, 1) Heterojunction Bipolar Transistors, 2) FET Technology, 3) Optoelectronics, 4) Epitaxy, 5) Emerging Applications, 6) Processing, 7) Strain Engineering, 8) Surfaces and Interfaces, 9) Related Compounds, 10) Metrology and Characterization.
Join us as ECS comes to the Seattle Sheraton and Washington State Convention Center in Seattle, WA! Our strong technical program of 2,600 abstracts being presented in 46 symposia over five days will have something for everyone!
ECS meetings are well known for their strength in areas such as batteries/energy storage, fuel cells/energy conversion, carbon nanostructures, semiconductors, sensors, corrosion, and more. In addition, the Seattle meeting will explore newer areas such as materials recycling, data science for modeling and design, consumer products, and flexible electronics.
Take a moment and read a few topic close-ups, and see what is in store!
Topic Close-up #8Symposium G01: Semiconductor Wafer Bonding: Science, Technology, and Applications 15
Symposium Focus: The fifteenth symposium solicits original theoretical and experimental papers that document new developments and cover the full range of basic science, process technologies, and product applications of semiconductor wafer bonding (direct, anodic, thermo-compression, eutectic, adhesive bonding). Besides permanent bonding, temporary wafer bonding technique deserves also to be discussed regarding all the recent development in many 3D applications. Fundamental aspects of interest include surface preparations for bonding, film transferring, low temperature bonding, surface activation at bonding interfaces, bonding techniques, novel material composites to synthesize heterostructures. Presentations characterizing currently utilized materials and processes, as well as novel approaches to new materials systems and modeling and process simulations are encouraged. Practical aspects of interest include innovative developments in product architecture and new integration and processing schemes for microelectronics, photonics, MEMS, microtechnologies, nanotechnologies and other relevant applications.
Invited Speakers from CEA-Leti, imec, EVG, KTH, Qromis, and more will be featured during the symposium.
