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Vol. 16, No. 3

NOTE: The Volume number was printed as Vol. 17, which is incorrect. The correct Volume number for this issue is Volume 16.

Table of Contents (PDF)

From the Editor: Through the Eyes of History	p. 3
Pennington Corner: Following the Path	p. 7
Society News	p. 8
ECS Transactions from the Washington, DC Meeting	p. 10
Special Meeting Section: Washington, DC	p. 11
People	p. 25
Tech Highlights	p. 28
Foreword Frosch & Derick: Fifty Years Later by: Howard R. Huff and Michael Riordan	p. 29
The Origins of Diffused-Silicon Technology at Bell Labs, 1954-55 by: Nick Holonyak, Jr.	p. 30
From Bell Labs to Silicon Valley: A Saga of Semiconductor Technology Transfer, 1955-61 by: Michael Riordan	p. 36
A Scientist's Perspective on the Early Days of MOS Technology by: Bruce E. Deal	p. 42
MOS Technology, 1963-1974: A Dozen Crucial Years by: Ross Knox Bassett	p. 46
Gate Dielectric Process Technology for the Sub-1 nm Equivalent Oxide (EOT) Era by: L. Colombo, J. J. Chambers, and H. Niimi	p. 51
Section News	p. 56
Awards	p. 58
New Members	p. 61
Student News	p. 65
ECS Transactions from the Chicago, IL Meeting	p. 68