Topic Close-up #16
Symposium: G02—Atomic Layer Deposition and Etching Applications 18
Deadline for Submitting Abstracts:
April 22, 2022
Submit today!
Symposium focus: The organizers of the G02 symposium, Atomic Layer Deposition Applications, 18, encourage you to submit your abstracts on the following (and closely related) topics:
- Semiconductor CMOS applications: Development and integration of ALD high-k oxides and metal electrodes with conventional and high-mobility channel materials;
- Volatile and non-volatile memory applications: Extendibility, Flash, MIM, MIS, RF capacitors, etc.;
- Interconnects and contacts: Integration of ALD films with Cu and low-k materials;
- Fundamentals of ALD processing: Reaction mechanisms, in situ measurement, modelling, theory;
- New precursors and delivery systems;
- Optical and photonic applications;
- Coating of nanoporous materials by ALD;
- MLD and hybrid ALD/MLD;
- ALD for energy conversion applications such as fuel cells, photovoltaics, etc.;
- ALD for energy storage applications;
- Productivity enhancement, scale-up and commercialization of ALD equipment and processes for rigid and flexible substrates, including roll-to-roll deposition;
- Area-selective ALD;
- Atomic layer etching (“reverse ALD”) and related topics aiming at self-limited etching, such as atomic layer cleaning, etc.
Submit meeting abstracts no later than April 22, 2022, via the ECS website: https://ecs.confex.com/ecs/242/cfp.cgi
More details can be found on the Call for Papers and instructions on how to submit your abstract.
Students are encouraged to apply for (partial) travel support.
Invited presentations
- “Area-Selective Spatial Atomic Layer Deposition of Silicon-Based Materials”
Alfredo Mameli, TNO-Holst Centre, Eindhoven - “Atomic Layer Etching of Metals and Alloys”
Andrew Teplyakov, University of Delaware - “Investigating Surface Reaction Thermodynamics: In Situ Calorimetry for Atomic Layer Deposition”
Ashley Bielinski, Argonne National Laboratory - “ALD coatings for Li-ion batteries and All-Solid-State Battery applications”
David Kitsche, Karlsruher Institut für Technologie - “ALE based manufacturing of nanostructures with feature size < 20 nm”
Dmitry Suyatin, Alix Labs - “Nm-Scale Patterns and Selectivity: a Blessing or a Curse?”
Jan-Willem Clerix, IMEC - “Ligand Addition for Thermal Atomic Layer Etching of Metals”
Jessica Murdzek, University of Colorado - “ALD Templates for Constructing Functional MOF Thin Films”
Junjie Zhao, Zhejiang University - “ALD of phosphates for Li-ion battery applications”
Lowie Henderick, Universiteit Gent - “Measuring the atomic structure of ALD-modified interfaces”
Matthias Young, University of Missouri - “ALD-based infiltration and growth of inorganic materials in polymers”
Tamar Segal-Peretz, Technion - “ALD and ALE for ferroelectric HfO2 based films and devices”
Patrick Lomenzo, NamLab - “Atomic Layer Deposition of FeSe2, CoSe2, and NiSe2“
Xinwei Wang, Beijing University
Invited tutorials
- Tutorial: “Gas phase coating of particles for energy applications”
Ruud van Ommen, Technische Universiteit Delft - Tutorial: “Selective-area ALD”
Greg Parsons, North Carolina State University
U.S. Visa application
To accelerate your U.S. Visa application process, take or forward this ECS Invitation Letter to the nearest U.S. Consulate or Embassy. Please note: this invitation letter does not constitute a visa application. We cannot guarantee that it enables you to obtain a Visa. For more information, see: https://www.electrochem.org/242/visa-travel/.
Mrs. JaneAnn Wormann at ECS (janeann.wormann@electrochem.org) can provide you with an official participation letter on behalf of The Electrochemical Society.
Travel grants
The deadline for division-sponsored Student and Young Professional/Early Career Travel Grants is June 27, 2022.
We look forward to meeting you in Atlanta!
Symposium G02 organizers:
- F. Roozeboom, Universiteit Twente, and LionVolt B.V., e-mail: f.roozeboom@utwente.nl
- S. De Gendt, IMEC and Katholieke Universiteit Leuven, e-mail: Stefan.Degendt@imec.be
- J. Dendooven, Universiteit Gent, e-mail: Jolien.Dendooven@UGent.be
- J. W. Elam, Argonne National Laboratory, email: jelam@anl.gov
- O. van der Straten, IBM Research, e-mail: ovander@us.ibm.com
- A. Illiberi, ASM Europe, email: andrea.illiberi@asm.com
- G. Sundaram, Veeco, e-mail: gsundaram@veeco.com
- R. Chen, Huazhong University of Science and Technology, email: rongchen@mail.hust.edu.cn
- Oana Leonte, Berkeley Polymer Technology, e-mail: oana.leonte@yahoo.com
- Thorsten Lill, Lam Research, email: thorsten.lill@lamresearch.com
- Matthias Young, University of Missouri, e-mail: matthias.young@missouri.edu
Check the Call for Papers for more information.
