Register today!
Topic Close-up #11
Symposium G02: Atomic Layer Deposition Applications 15
Symposium focus: This symposium contains cutting edge research results on applications in Atomic Layer Processing, and will focus on a variety of applications of ALD and other atomic layer-by-layer processing (like etching and cleaning) in semiconductor CMOS (e.g. high-k oxides and metals for memories like Flash and 3D NAND, MIM, MIS capacitors), photovoltaics, energy storage and conversion, catalysis, optics and photonics, smart coatings of nanoporous materials, MLD and hybrid ALD/MLD, fundamentals of ALD processing: reaction mechanisms, in-situ measurement, modeling, theory, new precursors and delivery systems, optical and photonic applications, productivity enhancement, scale-up and commercialization of ALD equipment and processes for rigid and flexible substrates, including roll-to-roll deposition, spatial ALD, area-selective ALD, Atomic Layer Etching (‘reverse ALD’) and related topics aiming at self-limited etching. (more…)