Thomas Fuller, JES Technical Editor, and guest editors
Bryan Pivovar, Kathy Ayers, Marcelo Carmo, Jim O’Brien, and
Xiaoyu Zhang, invite you to submit to the:

JES Focus Issue:

Electrolysis for Increased Renewable Energy Penetration

Submission Deadline | April 7, 2016

This special issue of the Journal of The Electrochemical Society focuses on electrolysis. Interest in this area has increased significantly with focus on several different technological approaches, each with their own unique challenges. Examples include, cost challenges for PEM water electrolysis, and thermal and durability challenges for high-temperature, solid-oxide electrolysis.

Topics of interest to this special issue of JES include, but are not limited to:

• Novel approaches for electrocatalysts including nanostructures with enhanced activities, durability, and cost reduction
• Fundamental studies of the chemical processes on solid surfaces and triple-phase-boundaries
• Polymers, ion conducting ceramics, membranes, and electrodes for electrolysis applications
• New approaches on the design and characterization of membrane/separator components
• New architectures for porous transport medias and bipolar plates

Read more topics of interest.

Submission Deadline | April 7, 2016

We invite original contributions from both fundamental and applied work that falls in the technical areas of interest of JES readership.

Please submit manuscripts at http://ecsjournals.msubmit.net.

Papers accepted into this focus issue are published online within 10 days of acceptance. The issue is created online an article at a time with the final article published in September 2016.

This special issue of the ECS Journal of Solid State Science and Technology focuses on defect characterization in semiconductor materials and devices. We especially welcome papers in the following domains:

• Structural, chemical, electrical and optical characterization of extended defects in semiconductor nano-structures and materials
• Electrical and optical characterization of point defects in semiconductor nano-structures
• Semiconductor-device-based defect analysis
• Impact of (extended) defects on device and circuit operation and yield
• Defect characterization and control in hetero-epitaxial layers and nano-structures grown on Si, comprising Ge, SiGe, GeSn, III-V and III-nitrides
• Ab initio calculations and TCAD of the electrical activity of (extended) defects in semiconductor materials and devices
• Defect control and mitigation strategies during hetero-epitaxial deposition

Find out more!

Submission Deadline | Oct. 21, 2015
Papers accepted into this focus issue are published online within 10 days of acceptance.
The issue is created online an article at a time with the final article published in March 2016.

Call for Papers
JES Focus Issue:

Electrochemical Interfaces in Energy Storage Systems

Submission Deadline | June 20, 2015

Focusing on a better understanding of the mechanism of electronic and ionic transport phenomena across electrode-electrolyte interfaces and solid-state interphases in electrochemical energy storage systems. Learn more.

The editors of the ECS Journal of Solid State Science and Technology are calling for papers for the upcoming focus issue: Novel Applications of Luminescent Optical Materials.

Submission Deadline: July 15, 2015

Submit your manuscript today!

The research landscape of luminescent and optical materials is rapidly changing due to a need for such materials outside the lighting and display technologies. Novel materials are needed and are developed with luminescent and optical properties appropriately tuned for applications in solar cells, sensors, bio-imaging, light extraction, and related opto-electronics in addition to solid state lighting and display technologies.

Find out more.

Read previous focus issues in ECS journals.

The call for abstracts for the 228th ECS Meeting to be held Oct. 11-16, 2015 in Phoenix, AZ is now open.

Meeting abstracts should explicitly state objectives, new results, and conclusions or significance of the work.

Regardless of whether you submit as a poster or an oral presentation, it is at the symposium organizers’ discretion whether it is scheduled for an oral or poster presentation.

Technical programming for this meeting will be determined in June 2015.

Abstracts are due no later than May 1, 2015.

Find out more.

The editors of the Journal of The Electrochemical Society (JES) and the ECS Journal of Solid State Science and Technology (JSS) are calling for papers for these upcoming focus issues:

JES Focus Issues:

Electrochemical Interfaces in Energy Storage Systems
Submission Deadline: June 1, 2015
Focusing on a better understanding of the mechanism of electronic and ionic transport phenomena across electrode-electrolyte interfaces and solid-state interphases in electrochemical energy storage systems. READ MORE.

Redox Flow Batteries – Reversible Fuel Cells
Submission Deadline: August 1, 2015
Focusing on integration of renewable energy sources, like wind and solar into the electrical grid system and how that poses major challenges due to their variable nature and unpredictable availability. READ MORE.

(more…)

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

Atomic Layer Etch (ALEt) and Atomic Layer Clean (ALC) are emerging as enabling technologies for sub 10nm technology nodes. At these scales performance will be extremely sensitive to process variation.

Atomic layer processes are the most promising path to deliver the precision needed. However, many areas of ALEt and ALC are in need of improved fundamental understanding and process development. This focus issue will cover state-of-the-art efforts that address a variety of approaches to ALEt and ALC.

Topics of interest include but are not limited to:

• Surface reaction chemistry and its impact on selectivity
• Plasma ion energy distribution and control methods
• Novel plasma sources and potential application to ALEt & ALC
• Innovative approaches to atomic layer material removal
• Novel device applications of ALEt & ALC
• Process chamber design considerations
• Advanced delivery of chemicals to processing chambers
• Metrology and control of ALEt & ALC
• Device performance impact
• Synthesis of new chemistries for ALEt & ALC application
• Damage free surface defect removal
• Process and discharge modeling

Find out more!

Deadline for submission of manuscripts is December 17, 2014.

Please submit manuscripts here.

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

Printing technologies in an atmospheric environment offer the potential for low-cost and materials-efficient alternatives for manufacturing electronics and energy devices such as luminescent displays, thin film transistors, sensors, thin film photovoltaics, fuel cells, capacitors, and batteries.

This focus issue will cover state-of-the-art efforts that address a variety of approaches to printable functional materials and devices.

Topics of interest include but are not limited to:

• Printable functional materials: metals; organic conductors; organic and inorganic semiconductors; and more
• Functional printed devices: RFID tags and antenna; thin film transistors; solar cells; and more
• Advances in printing and conversion processes: ink chemistry; ink rheology; printing and drying process; and more
• Advances in conventional and emerging printing techniques: inkjet printing; aerosol printing; flexographic printing; and more

Find out more!

Deadline for submission of manuscripts is November 30, 2014.

Please submit manuscripts here.

The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

Atomic Layer Etch (ALEt) and Atomic Layer Clean (ALC) are emerging as enabling technologies for sub 10nm technology nodes. At these scales performance will be extremely sensitive to process variation.

Atomic layer processes are the most promising path to deliver the precision needed. However, many areas of ALEt and ALC are in need of improved fundamental understanding and process development. This focus issue will cover state-of-the-art efforts that address a variety of approaches to ALE and ALC.

Topics of interest include but are not limited to:

• Surface reaction chemistry and its impact on selectivity
• Plasma ion energy distribution and control methods
• Novel plasma sources and potential application to ALEt & ALC
• Innovative approaches to atomic layer material removal
• Novel device applications of ALEt & ALC
• Process chamber design considerations
• Advanced delivery of chemicals to processing chambers
• Metrology and control of ALEt & ALC
• Device performance impact
• Synthesis of new chemistries for ALEt & ALC application
• Damage free surface defect removal
• Process and discharge modeling

Find out more.

Plan now to participate at CSTIC 2015, one of the largest and the most comprehensive annual semiconductor technology conferences in China.

We invite you to submit your papers now for the China Semiconductor Technology International Conference 2015, one of the largest and the most comprehensive annual semiconductor technology conferences in China. CSTIC is organized by SEMI and IEEE, co-organized by China’s High-Tech Expert Committee (CHTEC). It is co-sponsored by ECS, MRS and China Electronics Materials Industry Association. CSTIC 2015 will be held on March 15-16, 2015 at the SHICC, Shanghai, China, in conjunction with SEMICON China 2015. It will cover all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. Hot topics, such as 3D integration, III-V semiconductors, carbon nanoelectronics, LEDs, and MEMS. And CPTIC 2015 has joined CSTIC 2015 as Symposium XII : Si Materials and Photovoltaic Technology.

We are soliciting papers from authors around the world on all aspects of semiconductor and photovoltaic technology and manufacturing, including semiconductor design, Frond-End-of-Line (FEOL), Back-End-of-Line (BEOL), packaging, testing, as well as emerging semiconductor technologies; photovoltaic market, policy, power grid, device, design, process, tooling, materials, and fundamental study between China and the rest of the world with a focus on industrial applications.

Submit your abstract online.