To recognize the innovative research gaining attention across the diverse span of its topical interest areas, the Society highlights the top five most-downloaded journal articles in each TIA during each quarter of the year.
The most-downloaded ECS Journal of Solid State Science and Technology articles by TIA during the fourth quarter of 2018 (October through December) are listed below.
Highlights are based on articles published since January 1, 2016.
Articles marked OA are open access.
To recognize the innovative research gaining attention across the diverse span of its topical interest areas, the Society highlights the top five most-downloaded journal articles in each TIA during each quarter of the year.
The most-downloaded ECS Journal of Solid State Science and Technology articles by TIA during the third quarter of 2018 (July through September) are listed below.
Highlights are based on articles published since January 1, 2016.
ALL of the articles listed below are open access.
To recognize the innovative research gaining attention across the diverse span of its topical interest areas, the Society highlights the top five most-downloaded journal articles in each TIA during each quarter of the year.
The most-downloaded ECS Journal of Solid State Science and Technology articles by TIA during the second quarter of 2018 (April through June) are listed below.
Highlights are based on articles published since January 1, 2016.
Articles marked OA are open access.
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The journal impact factors (JIFs) for the ECS journals continue to grow, as evidenced by the data recently released by Clarivate Analytics. For the 2017 reporting year, the ECS journals continue to be among the top-ranked journals. Journal of The Electrochemical Society (JES) is in the top two for Materials Science, Coatings, and Films; and in the top ten for Electrochemistry. The JIFs are published in Journal Citation Reports (JCR) and are just one metric used to gauge the quality of a large number of scholarly journals.
Three new Editors’ Choice articles have been published recently in the Journal of The Electrochemical Society (JES) and ECS Journal of Solid State Science and Technology (JSS).
An Editors’ Choice article is a special designation applied by the Journals’ Editorial Board to any article type. Editors’ Choice articles are transformative and represent a substantial advance or discovery, either experimental or theoretical. The work must show a new direction, a new concept, a new way of doing something, a new interpretation, or a new field, and not merely preliminary data.
The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.
Atomic Layer Etch (ALEt) and Atomic Layer Clean (ALC) are emerging as enabling technologies for sub 10nm technology nodes. At these scales performance will be extremely sensitive to process variation.
Atomic layer processes are the most promising path to deliver the precision needed. However, many areas of ALEt and ALC are in need of improved fundamental understanding and process development. This focus issue will cover state-of-the-art efforts that address a variety of approaches to ALEt and ALC.
Topics of interest include but are not limited to:
Deadline for submission of manuscripts is December 17, 2014.
The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.
Printing technologies in an atmospheric environment offer the potential for low-cost and materials-efficient alternatives for manufacturing electronics and energy devices such as luminescent displays, thin film transistors, sensors, thin film photovoltaics, fuel cells, capacitors, and batteries.
This focus issue will cover state-of-the-art efforts that address a variety of approaches to printable functional materials and devices.
Topics of interest include but are not limited to:
Deadline for submission of manuscripts is November 30, 2014.
The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.
Atomic Layer Etch (ALEt) and Atomic Layer Clean (ALC) are emerging as enabling technologies for sub 10nm technology nodes. At these scales performance will be extremely sensitive to process variation.
Atomic layer processes are the most promising path to deliver the precision needed. However, many areas of ALEt and ALC are in need of improved fundamental understanding and process development. This focus issue will cover state-of-the-art efforts that address a variety of approaches to ALE and ALC.
Topics of interest include but are not limited to:
