The Electrochemical Society and Enago have entered into a collaboration that will allow researchers within ECS’s member network easy access to Enago’s author services, including English manuscript editing and publication support, at every stage of the publication cycle.

ECS exists to advance global knowledge and practice in the sphere of electrochemistry and solid state science. It’s an international community, led by scientists, for scientists. Its members, individual and institutional, can take advantage of the vast programs offered, such as awards, grants, fellowships, and much more. (more…)

ECS celebrates Krishnan (Raj) Rajeshwar, a professor, researcher, former Interface editor, and former ECS president, by honoring him, on the occasion of his 70th birthday, with a Journal of The Electrochemical Society focus issue on semiconductor electrochemistry and photoelectrochemistry.

Learn more.

Topics of interest include but are not limited to fundamental studies on electrochemistry, photoelectrochemistry, and semiconductor devices.

Raj has spent a great deal of his career focusing in on the understanding and application of semiconductor electrochemistry and photoelectrochemistry himself. His research also includes work in solar energy conversion, environmental chemistry, and more. It’s evident that Raj is passionate about his life’s work.

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The ECS Journal of Solid State Science and Technology (JSS) is one of the newest peer-reviewed journals from ECS launched in 2012.

Atomic Layer Etch (ALEt) and Atomic Layer Clean (ALC) are emerging as enabling technologies for sub 10nm technology nodes. At these scales performance will be extremely sensitive to process variation.

Atomic layer processes are the most promising path to deliver the precision needed. However, many areas of ALEt and ALC are in need of improved fundamental understanding and process development. This focus issue will cover state-of-the-art efforts that address a variety of approaches to ALEt and ALC.

Topics of interest include but are not limited to:

• Surface reaction chemistry and its impact on selectivity
• Plasma ion energy distribution and control methods
• Novel plasma sources and potential application to ALEt & ALC
• Innovative approaches to atomic layer material removal
• Novel device applications of ALEt & ALC
• Process chamber design considerations
• Advanced delivery of chemicals to processing chambers
• Metrology and control of ALEt & ALC
• Device performance impact
• Synthesis of new chemistries for ALEt & ALC application
• Damage free surface defect removal
• Process and discharge modeling

Find out more!

Deadline for submission of manuscripts is December 17, 2014.

Please submit manuscripts here.