Hiroshi Iwai has worked in the semiconductor industry for 26 years. After receiving BE and PhD degrees from the University of Tokyo, he worked at both Toshiba Corporation and Tokyo Institute of Technology. Currently, he is Professor Emeritus at the Tokyo Institute of Technology, and vice dean and Distinguished Chair Professor of National Chiao Tung University in Taiwan.
Iwai is highly recognized for his significant contributions for the development of dielectric films. Those contributions include: introduction of BPSG film reflow to integrated circuits, finding plasma induced damage on gate insulator, prevention of boron penetration of gate oxide by RTN gate SiO2, and the introduction of 1.5 nm tunneling gate oxide to CMOS.
Additionally, Iwai is the chair of the ECS Japan Section. He has served as an organizer of many ECS symposia and has been a member of various Society committees. Iwai co-authored over 1,000 international and 500 domestic papers in journals and for conferences.
