Deadline for Submitting Abstracts
March 30, 2018
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Topic Close-up #10
Symposium G02: Atomic Layer Deposition Applications 14
Symposium Focus: This symposium focuses on a variety of applications of ALD and other atomic layer-by-layer processing in semiconductor CMOS (e.g. high-k oxides and metals for memories like Flash and 3D NAND, MIM, MIS capacitors), photovoltaics, energy storage and conversion, catalysis, optics and photonics, smart coatings of nanoporous materials, MLD and hybrid ALD/MLD, fundamentals of ALD processing: reaction mechanisms, in-situ measurement, modeling, theory, new precursors and delivery systems, optical and photonic applications, productivity enhancement, scale-up and commercialization of ALD equipment and processes for rigid and flexible substrates, including roll-to-roll deposition, spatial ALD, area-selective ALD, Atomic Layer Etching (‘reverse ALD’) and related topics aiming at self-limited etching.
Tutorials will be held on “Basics of Atomic Layer Etching” by Dr. Thorsten Lill, Lam Research, USA and “ALD precursors for ALD” by Prof. Chuck Winter, Wayne University, USA.
Tentative Invited Speakers include:
- Mikko Nisula, Aalto University, Finland, “ALD/MLD for thin-film Li-ion batteries”
- Cathérine Marichy, University of Lyon, France, “ALD for gas sensing applications”
- Anil Mane, Argonne National Laboratory, USA, “ALD and ALE of 2D materials”
- Riikka Puurunen, Aalto University, Finland, “Learnings from an Open Science Effort: Virtual Project on the History of ALD”
- Alexey Kovalgin, Twente University, Netherlands, “A comparative study of low-temperature III-V nitrides ALD in thermal and radical-enhanced modes”
- Thorsten Lill, Lam Research, USA, “Atomic Layer Etching”
- Geun Young Yeom, SKKU, Korea, “Layer control of 2D-MoS2 by Atomic Layer Etching and its device characteristics”
- Mark Saly, Applied Materials, USA, “Challenges and applications in Atomic Layer Processing”
- Chuck Winter, Wayne University, USA, “Precursors for ALD”
- Ganesh Sundaram, Veeco, “Innovations in ALD”
- Alex Pearse, Modern Electron, USA, “LiPON ALD for Li-ion batteries”
- Neil Dasgupta, University of Michigan, “Interfacial engineering of energy conversion and storage materials by ALD”
